300L、500L、1000L中型低(di)溫(wen)制(zhi)冷(leng)(leng)(leng)機(ji)(ji)(ji)組定(ding)制(zhi)，在(zai)制(zhi)冷(leng)(leng)(leng)行業中分(fen)為(wei)風冷(leng)(leng)(leng)式(shi)(shi)冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)組和水(shui)(shui)(shui)冷(leng)(leng)(leng)式(shi)(shi)冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)組兩種，根據壓縮機(ji)(ji)(ji)又分(fen)為(wei)螺桿式(shi)(shi)冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)組和渦(wo)旋式(shi)(shi)冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)組，在(zai)溫(wen)度(du)(du)(du)控制(zhi)上分(fen)為(wei)低(di)溫(wen)工業冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)和常溫(wen)冷(leng)(leng)(leng)水(shui)(shui)(shui)機(ji)(ji)(ji)，常溫(wen)機(ji)(ji)(ji)組溫(wen)度(du)(du)(du)一般控制(zhi)在(zai)0度(du)(du)(du)-35度(du)(du)(du)范圍內。低(di)溫(wen)機(ji)(ji)(ji)組溫(wen)度(du)(du)(du)控制(zhi)一般在(zai)0度(du)(du)(du)至-100度(du)(du)(du)左(zuo)右。
DLSB-300L大型(xing)低溫冷卻循環制冷機組(zu)阿(a)貝折光儀、旋(xuan)光儀、原子吸收、ICP-MS 、ICP、核(he)磁共(gong)振、CCD、生物發酵(jiao)罐、化(hua)學(xue)反(fan)應器(qi)(qi)（合成(cheng)器(qi)(qi)）等(deng)。材料領(ling)(ling)域：電鏡(jing)、X射(she)(she)線(xian)衍(yan)射(she)(she)、X熒(ying)光、真(zhen)空(kong)濺射(she)(she)電鍍(du)、真(zhen)空(kong)鍍(du)膜機、ICP刻蝕、各(ge)種半(ban)導體設備、疲勞試(shi)驗機、化(hua)學(xue)沉積系統、原子沉積系統等(deng)。醫療(liao)領(ling)(ling)域：超(chao)導磁共(gong)振、直線(xian)加速器(qi)(qi)、CT、低磁場(chang)核(he)磁共(gong)振、X光機、微波治療(liao)機、醫用冷帽、降(jiang)溫毯等(deng)等(deng)。